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Micronanoelectronic Technology
FQ: 月刊
AD of Publication: 河北省石家庄市
Lanuage: 中文;
ISSN: 1671-4776
CN: 13-1314/TN
YP: 1964
Url: 中国电子科技集团公司第十三研究所
Recommended Journals
Micronanoelectronic Technology
2009 -01
Preparation and Effect of Nanometer Mn_3O_4 by Oxidation Precipitation Method Suo Liumin1,2,Hua Ning1,2,Han Ying1,Kang Xueya1 (1.Xinjiang Technical Institute of Physics and Chemistry,Chinese Academy of Sciences,Urumqi 830011,China;2.Graduate University of Chinese Academy of Sciences,Beijing 100039,China)
Effect of Reactants Quantity on Nanostructure and Mechanical Properties of Bulk Nanocrystalline Fe_3Al La Peiqing,Wang Li,Cheng Chunjie,Zhao Yang,Yang Yang (State Key Laboratory of Gansu Non-Ferrous Metal Materials,Lanzhou University of Technology,Lanzhou 730050,China)
Digital Monolithic Integrated Circuits Based on RTTs Li Xiaobai (National Key Laboratory of ASIC,Shijiazhuang 050051,China)
Multiple-Value Logic(MVL) Circuits Based on RTDs Guo Weilian1,2,3 (1.School of Information and Communication,Tianjin Polytechnic University,Tianjin 300106,China;2.National Key Laboratory of ASIC,Shijiazhuang 050051,China;3.School of Electronic Information and Engineering,Tianjin University,Tianjin 300072,China)
Facet Treatment of High-Power Semiconductor Laser Diodes Hua Jizhen1,2,Qi Zhihua1,Yang Hongwei1,Du Weihua2,Chen Guoying2 (1.The 13th Research Institute,CETC,Shijiazhuang 050051,China;2.Hebei University of Technology,Tianjin 300130,China)
Development of Structural Design and Simulation Analysis for Dielectrophoresis Microchips Zeng Xue a,b,Xu Yi a,b,c,Cao Qiang a,Hao Dunling a,Wu Yongjie a (a.Chemistry and Chemical Engineering College;b.Defense Key Disciplines Laboratory of Novel Micro-nano Devices and System Technology;c.International R & D center of Micro-Nano Systems and New Materials Technology,Chongqing University,Chongqing 400030,China)
Research on Microchannel Fabrication of PCR Chip by Electron Beam Lithography Based on Overlapped Scanning Kong Xiangdong1,2,Feng Shengyu1,Zhang Yulin3 (1.School of Chemistry and Chemical engineering,Shandong University,Jinan 250100,China;2.Department of Scientific Research,Dongying Polytechnic Institute,Dongying 257091,China;3.Institute of Electron Beam,School of Control Science and Engineering,Shandong University,Jinan 250061,China)
Si_2Sb_2Te_5 Based Ultra-High-Density PCRAM Arrays Fabricated by UV-IL Liu Yanbo1,2,Min Guoquan1,Song Zhitang2,Zhou Weimin1,Zhang Jing1,Zhang Ting2,Wan Yongzhong1,Li Xiaoli1,Zhang Jianping1 (1.Laboratory of Nano-Technology,Shanghai Nanotechnology Promotion Center,Shanghai 200237,China;2.Laboratory of Nano-Technology,Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences,Shanghai 200050,China)
Analysis of Influencing Factors of Sapphire Substrate CMP Removal Rate Zong Simiao,Liu Yuling,Niu Xinhuan,Li Xianzhen,Zhang Wei (Institute of Microelectronics,Hebei University of Technology,Tianjin 300130,China)
Simulation of Low-Energy Electron Scattering in Electron Beam Exposure Luo Xiaobin,Yu Zhaoxian (School of Science,Beijing Information Science and Technology University,Beijing 100101,China)
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